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 Click to enlarge image
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 Model Number |
HIPS Series |
Overview
HCD Ion Plating System, as an equipment of using a hollow cathode discharge,
which holds a high energy of low voltage and high current, coats a thin-film
on the substrate by vaporizing the material in a crucible.
Feature
Special HCD type - heating, cleaning and coating in one HCD
- Ultra-wide electronic beam (~300A)
- Reactive characteristics and excellent adhesion (Above 25% ionization)
- Insulated conductive material plating possible ( Above 10% electronic beam)
- Self diagnosis made before processing and auto process in every step
- program : operating and editing
Specification
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Classification
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HIPS-520
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HIPS-820
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Chamber Size
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Ø520 x H420
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Ø820 x H420
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Source
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EA-HCD
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EA-HCD
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Arc P/S
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25kW
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25kW
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Source Q'ty
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1 Set
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1 Set
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Bias P/S
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4.8kW
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Electricity
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220V x 225A x 3P
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220V x 225A x 3P
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Comp. Air
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5 ~ 8Kgf/cm2
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Cooling Wate
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2.5 ~ 3Kgf/cm2, 18 ~ 25°C, Distilled Water
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Process Gas
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99.999% Pure Gas
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Cooling Control
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Hot cooling system (Temp. 25 ~ 50°C)
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System Ground
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Class-1 grounding or its relevant facility
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System Control
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PC and PLC Control
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Remarks
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Above specifications are our standards and they can
be adjustable from user's request
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Diagram of HIPS Series
Lay-out of HIPS-820
Applicable Areas
- Hard coating for cutting tools and molds
- TiN coatings for decorative applications
- Metal coatings for electronic applications
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